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Ruddlesden–Popper Tin-Based Halide Perovskite Field-Effect Transistors

Title of paper
Ruddlesden–Popper Tin-Based Halide Perovskite Field-Effect Transistors
Author
[노용영교수님 연구실] Ruddlesden-Popper 주석기반 할라이드 페로브스카이트 트랜지스터
Publication in journal
Small Structure 2300393 (2024).
Publication date
20240104

 

[Abstract]

 

Tin-based halide perovskites garner attention as a promising semiconducting layer material for field-effect transistors (FETs) owing to their lower effective mass than their lead-based counterparts. However, they suffer from low ambient stability because Sn2+ is readily oxidized to Sn4+ in air. To address this issue, Ruddlesden–Popper (RP) perovskites featuring large organic cations emerge as promising materials for FETs. In this article, a comprehensive overview of the properties and advantages of RP-phase tin-based halide perovskites used in FETs are provided. Recent advancements in 2D and 2D/3D RP tin-based perovskite FETs are examined, and challenges related to the fabrication of uniform large-area films and strategies for improving ambient stability and operational durability are discussed. In this review article, the potential of RP perovskites for FET applications is emphasized and the need for further research to unlock their full potential is highlighted.

 

DOI: 10.1002/sstr.202300393

LINK: https://onlinelibrary.wiley.com/doi/full/10.1002/sstr.202300393