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High-Performance Solution-Processed 2D P-Type WSe2 Transistors and Circuits through Molecular Doping

Title of paper
High-Performance Solution-Processed 2D P-Type WSe2 Transistors and Circuits through Molecular Doping
Author
[노용영교수님 연구실] 분자도핑을 통한 고성능 용액 제작 p-형 2차원 텅스텐 셀렌화물 트랜지스터와 회로
Publication in journal
Advanced Materials, 2208934 (2022)
Publication date
2022.11.23

[Abstract]

 

Semiconducting ink based on 2D single-crystal flakes with dangling-bond-free surfaces enables the implementation of high-performance devices on form-free substrates by cost-effective and scalable printing processes. However, the lack of solution-processed p-type 2D semiconducting inks with high mobility is an obstacle to the development of complementary integrated circuits. Here, a versatile strategy of doping with Br2 is reported to enhance the hole mobility by orders of magnitude for p-type transistors with 2D layered materials. Br2-doped WSe2 transistors show a field-effect hole mobility of more than 27 cm2 V−1 s−1, and a high on/off current ratio of ≈107, and exhibits excellent operational stability during the on-off switching, cycling, and bias stressing testing. Moreover, complementary inverters composed of patterned p-type WSe2 and n-type MoS2 layered films are demonstrated with an ultra-high gain of 1280 under a driving voltage (VDD) of 7 V. This work unveils the high potential of solution-processed 2D semiconductors with low-temperature processability for flexible devices and monolithic circuitry.

 

DOI: 10.1002/adma.202208934

Link: https://onlinelibrary.wiley.com/doi/full/10.1002/adma.202208934